High-rate reactive high-power impulse magnetron sputtering of Ta–O–N films with tunable composition and properties
Rezek, J., Vlček, J., Houška, J., Čerstvý, R.Volume:
566
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2014.07.033
Date:
September, 2014
File:
PDF, 1.88 MB
english, 2014