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Structural and electrical properties of K 0.5 Bi 0.5 TiO 3 thin films for ferroelectric field effect transistor applications
Jing, Xiangyang, Huang, Baibiao, Zhang, Xiaoyang, Qin, Xiaoyan, Wei, Jiyong, Wang, Xiaoning, Yao, Shushan, Xu, Zhenhua, Wang, Zeyan, Wang, PengVolume:
42
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/42/4/045421
Date:
February, 2009
File:
PDF, 575 KB
english, 2009