A neural-network approach to recognize defect spatial...

IEEE Transactions on Semiconductor Manufacturing 2000 / Aug. Vol. 13; Iss. 3

A neural-network approach to recognize defect spatial pattern in semiconductor fabrication

Fei-Long Chen,, Shu-Fan Liu,
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Volume:
13
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/66.857947
Date:
January, 2000
File:
PDF, 150 KB
english, 2000
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