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Some recent developments in the MOCVD and ALD of high-? dielectric oxides
Jones, Anthony C., Aspinall, Helen C., Chalker, Paul R., Potter, Richard J., Kukli, Kaupo, Rahtu, Antti, Ritala, Mikko, Leskel�, MarkkuVolume:
14
Year:
2004
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/B405525J
File:
PDF, 727 KB
english, 2004