![](/img/cover-not-exists.png)
Plasma Etching of Si, SiO[sub 2], Si[sub 3]N[sub 4], and Resist with Fluorine, Chlorine, and Bromine Compounds
Sparks, Douglas R.Volume:
139
Year:
1992
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2069485
File:
PDF, 654 KB
english, 1992