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Influence of O+2 energy, flux, and fluence on the formation and growth of sputtering-induced ripple topography on silicon
Vajo, John J.Volume:
14
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.580192
Date:
September, 1996
File:
PDF, 1.06 MB
english, 1996