Inductively coupled plasma chemical vapor deposition...

Infrared Physics & Technology 2014 / 11 Vol. 67

Inductively coupled plasma chemical vapor deposition silicon nitride for passivation of In0.83Ga0.17As photodiodes

Shi, Ming, Shao, Xiumei, Tang, Hengjing, Li, Tao, Wang, Yunji, Li, Xue, Gong, Haimei
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Volume:
67
Language:
english
Journal:
Infrared Physics & Technology
DOI:
10.1016/j.infrared.2014.06.003
Date:
November, 2014
File:
PDF, 845 KB
english, 2014
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