Thermally Stable Photocuring Chemistry for Selective...

Thermally Stable Photocuring Chemistry for Selective Morphological Trapping in Block Copolymer Melt Systems

Scalfani, Vincent F., Bailey, Travis S.
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Volume:
22
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm102374t
Date:
November, 2010
File:
PDF, 933 KB
english, 2010
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