On the road to self-sputtering in high power impulse magnetron sputtering: particle balance and discharge characteristics
Huo, Chunqing, Lundin, Daniel, Raadu, Michael A, Anders, André, Gudmundsson, Jon Tomas, Brenning, NilsVolume:
23
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/23/2/025017
Date:
April, 2014
File:
PDF, 1.20 MB
english, 2014