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A New Positive-Type Photosensitive Alkaline-Developable Alicyclic Polyimide Based on Poly(amic acid silylester) as a Polyimide Precursor and Diazonaphthoquinone as a Photosensitive Compound
Watanabe, Yasufumi, Shibasaki, Yuji, Ando, Shinji, Ueda, MitsuruVolume:
14
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm0115362
Date:
April, 2002
File:
PDF, 92 KB
english, 2002