Self-Assembled Monolayer Islands Masked Chemical Etching...

The Journal of Physical Chemistry C 2010 / 02 Vol. 114; Iss. 5

Self-Assembled Monolayer Islands Masked Chemical Etching for Broad-Band Antireflective Silicon Surfaces

Wang, Wen-Tao, Lu, Nan, Hao, Juan-Yuan, Xu, Hong-Bo, Qi, Dian-Peng, Chi, Li-Feng
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Volume:
114
Language:
english
Journal:
The Journal of Physical Chemistry C
DOI:
10.1021/jp908139h
Date:
February, 2010
File:
PDF, 2.37 MB
english, 2010
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