Photoreactive Chemisorbed Monolayer Suppressing Polymer...

Langmuir 2009 / 06 Vol. 25; Iss. 12

Photoreactive Chemisorbed Monolayer Suppressing Polymer Dewetting in Thermal Nanoimprint Lithography

Oda, Hirokazu, Ohtake, Tomoyuki, Takaoka, Toshiaki, Nakagawa, Masaru
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Volume:
25
Language:
english
Journal:
Langmuir
DOI:
10.1021/la900902f
Date:
June, 2009
File:
PDF, 3.91 MB
english, 2009
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