Projection Photolithography Utilizing a Schwarzschild...

Langmuir 1996 / 01 Vol. 12; Iss. 8

Projection Photolithography Utilizing a Schwarzschild Microscope and Self-Assembled Alkanethiol Monolayers as Simple Photoresists †

Behm, Jane M., Lykke, Keith R., Pellin, Michael J., Hemminger, John C.
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Volume:
12
Language:
english
Journal:
Langmuir
DOI:
10.1021/la950811u
Date:
January, 1996
File:
PDF, 175 KB
english, 1996
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