Reduction of Chemical Reaction Mechanism for...

Industrial & Engineering Chemistry Research 2009 / 04 Vol. 48; Iss. 8

Reduction of Chemical Reaction Mechanism for Halide-Assisted Silicon Carbide Epitaxial Film Deposition

Wang, Rong, Ma, Ronghui, Dudley, Michael
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Volume:
48
Language:
english
Journal:
Industrial & Engineering Chemistry Research
DOI:
10.1021/ie8017093
Date:
April, 2009
File:
PDF, 850 KB
english, 2009
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