Determination of the implantation-dose in silicon wafers by...

Analytical Chemistry 1990 / 08 Vol. 62; Iss. 15

Determination of the implantation-dose in silicon wafers by x-ray fluorescence analysis

Klockenkaemper, Reinhold., Becker, Maria., Bubert, Henning., Burba, Peter., Palmetshofer, Leopold.
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Volume:
62
Language:
english
Journal:
Analytical Chemistry
DOI:
10.1021/ac00214a028
Date:
August, 1990
File:
PDF, 416 KB
english, 1990
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