Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2000 Vol. 18; Iss. 5
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Pulse-time-modulated inductively coupled plasma etching for high-performance polysilicon patterning on thin gate oxides
H. Ohtake, K. Noguchi, S. Samukawa, H. Iida, A. Sato, X. QianVolume:
18
Year:
2000
Language:
english
DOI:
10.1116/1.1312261
File:
PDF, 599 KB
english, 2000