Tuning PDMS Brush Chemistry by UV–O 3...

Langmuir 2013 / 07 Vol. 29; Iss. 28

Tuning PDMS Brush Chemistry by UV–O 3 Exposure for PS- b -PDMS Microphase Separation and Directed Self-assembly

Borah, Dipu, Rasappa, Sozaraj, Senthamaraikannan, Ramsankar, Holmes, Justin D., Morris, Michael A.
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Volume:
29
Language:
english
Journal:
Langmuir
DOI:
10.1021/la401561k
Date:
July, 2013
File:
PDF, 3.14 MB
english, 2013
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