XPS and 19 F NMR Study of the Photodegradation at 157 nm of Photolithographic-Grade Teflon AF Thin Films
Blakey, Idriss, George, Graeme A., Hill, David J. T., Liu, Heping, Rasoul, Firas, Whittaker, Andrew K., Zimmerman, PaulVolume:
38
Language:
english
Journal:
Macromolecules
DOI:
10.1021/ma047436+
Date:
May, 2005
File:
PDF, 104 KB
english, 2005