Enhancing the Potential of Block Copolymer Lithography with...

Enhancing the Potential of Block Copolymer Lithography with Polymer Self-Consistent Field Theory Simulations

Mickiewicz, Rafal A., Yang, Joel K. W., Hannon, Adam F., Jung, Yeon-Sik, Alexander-Katz, Alfredo, Berggren, Karl K., Ross, Caroline A.
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Volume:
43
Language:
english
Journal:
Macromolecules
DOI:
10.1021/ma101360f
Date:
October, 2010
File:
PDF, 3.57 MB
english, 2010
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