Investigation of Self-Assembled Monolayer Resists for...

Chemistry of Materials 2005 / 02 Vol. 17; Iss. 3

Investigation of Self-Assembled Monolayer Resists for Hafnium Dioxide Atomic Layer Deposition

Chen, Rong, Kim, Hyoungsub, McIntyre, Paul C., Bent, Stacey F.
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Volume:
17
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm0486666
Date:
February, 2005
File:
PDF, 592 KB
english, 2005
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