Surface Wave Plasma Abatement of CHF 3 and CF 4 Containing Semiconductor Process Emissions
Wofford, Bill A., Jackson, Marc W., Hartz, Chris, Bevan, John W.Volume:
33
Language:
english
Journal:
Environmental Science & Technology
DOI:
10.1021/es9805472
Date:
June, 1999
File:
PDF, 85 KB
english, 1999