![](/img/cover-not-exists.png)
Electroless Copper/Nickel Films Deposited on AlN Substrates
Liang, Muh-Wang, Hsieh, Tsung-Eong, Chen, Chi-Chin, Hung, Yuan-TeVolume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.8258
Date:
December, 2004
File:
PDF, 662 KB
english, 2004