Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1999 Vol. 17; Iss. 6
Peak and integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography
Stuik, R., Louis, E., Yakshin, A. E., Görts, P. C., Maas, E. L. G., Bijkerk, F., Schmitz, D., Scholze, F., Ulm, G., Haidl, M.Volume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.590942
File:
PDF, 456 KB
english, 1999