Chemorheology of Sol−Gel Silica for the Patterning of High...

Chemistry of Materials 2010 / 05 Vol. 22; Iss. 10

Chemorheology of Sol−Gel Silica for the Patterning of High Aspect Ratio Structures by Nanoimprint

Letailleur, Alban, Teisseire, Jérémie, Chemin, Nicolas, Barthel, Etienne, Søndergård, Elin
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Volume:
22
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm100285b
Date:
May, 2010
File:
PDF, 2.04 MB
english, 2010
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