Non-porous ultra-low- k SiOCH...

Non-porous ultra-low- k SiOCH ( k = 2.3) for damage-free integration and Cu diffusion barrier

Kikuchi, Yoshiyuki, Wada, Akira, Kurotori, Takuya, Sakamoto, Miku, Nozawa, Toshihisa, Samukawa, Seiji
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
46
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/46/39/395203
Date:
October, 2013
File:
PDF, 1.01 MB
english, 2013
Conversion to is in progress
Conversion to is failed