Atomic Layer Deposition of Transparent VO x...

Chemical Vapor Deposition 2014 / 09 Vol. 20; Iss. 7-8-9

Atomic Layer Deposition of Transparent VO x Thin Films for Resistive Switching Applications

Singh, Trilok, Wang, Shuangzhou, Aslam, Nabeel, Zhang, Hehe, Hoffmann-Eifert, Susanne, Mathur, Sanjay
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Volume:
20
Language:
english
Journal:
Chemical Vapor Deposition
DOI:
10.1002/cvde.201407122
Date:
September, 2014
File:
PDF, 1.52 MB
english, 2014
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