Fabrication of Silicon Oxide Thin Films by Mist Chemical...

Fabrication of Silicon Oxide Thin Films by Mist Chemical Vapor Deposition Method from Polysilazane and Ozone as Sources

Piao, Jinchun, Katori, Shigetaka, Kawaharamura, Toshiyuki, Li, Chaoyang, Fujita, Shizuo
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Volume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.090201
Date:
August, 2012
File:
PDF, 617 KB
english, 2012
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