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Fabrication of Silicon Oxide Thin Films by Mist Chemical Vapor Deposition Method from Polysilazane and Ozone as Sources
Piao, Jinchun, Katori, Shigetaka, Kawaharamura, Toshiyuki, Li, Chaoyang, Fujita, ShizuoVolume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.090201
Date:
August, 2012
File:
PDF, 617 KB
english, 2012