Oxidation Resistance of Sputtered Ti[sub 1-x]Al[sub x]N Films for Complementary Metal Oxide Semiconductor Storage Node Electrode Barriers
Kim, Sam-Dong, Hwang, In-Seok, Rhee, Jin-Koo, Cha, Tae-Ho, Kim, Heon-DoVolume:
4
Year:
2001
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.1344286
File:
PDF, 369 KB
english, 2001