Selective Copper Chemical Vapor Deposition Using Pd-Activated Organosilane Films
Potochnik, Stephen J., Pehrsson, Pehr E., Hsu, David S. Y., Calvert, Jeffrey M.Volume:
11
Language:
english
Journal:
Langmuir
DOI:
10.1021/la00006a001
Date:
June, 1995
File:
PDF, 1.54 MB
english, 1995