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Decomposition of CH 3 SH in a RF Plasma Reactor: Reaction Products and Mechanisms
Tsai, Cheng-Hsien, Lee, Wen-Jhy, Chen, Chuh-Yung, Liao, Wei-TungVolume:
40
Language:
english
Journal:
Industrial & Engineering Chemistry Research
DOI:
10.1021/ie0009637
Date:
May, 2001
File:
PDF, 236 KB
english, 2001