Scalable high-mobility MoS 2...

Nanoscale 2014 / 09 Vol. 6; Iss. 21

Scalable high-mobility MoS 2 thin films fabricated by an atmospheric pressure chemical vapor deposition process at ambient temperature

Huang, Chung-Che, Al-Saab, Feras, Wang, Yudong, Ou, Jun-Yu, Walker, John C., Wang, Shuncai, Gholipour, Behrad, Simpson, Robert E., Hewak, Daniel W.
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Volume:
6
Language:
english
Journal:
Nanoscale
DOI:
10.1039/C4NR04228J
Date:
September, 2014
File:
PDF, 1.67 MB
english, 2014
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