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[IEEE 2014 IEEE Symposium on VLSI Technology - Honolulu, HI, USA (2014.6.9-2014.6.12)] 2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers - Electrostatics and performance benchmarking using all types of III–V multi-gate FinFETs for sub 7nm technology node logic application
Baek, R.-H., Kim, D.-H., Kim, T.-W., Shin, CS., Park, WK., Michalak, T., Borst, C., Song, S. C., Yeap, Geoffrey, Hill, R., Hobbs, C., Maszara, W., Kirsch, P.Year:
2014
Language:
english
DOI:
10.1109/VLSIT.2014.6894420
File:
PDF, 724 KB
english, 2014