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Atomic Layer Deposition of TiO x /Al 2 O 3 Bilayer Structures for Resistive Switching Memory Applications
Zhang, Hehe, Aslam, Nabeel, Reiners, Marcel, Waser, Rainer, Hoffmann-Eifert, SusanneVolume:
20
Language:
english
Journal:
Chemical Vapor Deposition
DOI:
10.1002/cvde.201407123
Date:
September, 2014
File:
PDF, 2.22 MB
english, 2014