Characteristics of Internal Inductively Coupled Plasma...

Japanese Journal of Applied Physics 2010 / 3 Vol. 49; Iss. 3

Characteristics of Internal Inductively Coupled Plasma Source for Ultralarge-Area Plasma Processing

Lim, Jong Hyeuk, Gweon, Gwang Ho, Hong, Seung Pyo, Kim, Kyong Nam, Kim, Yi Yeon, Yeom, Geun Young
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Volume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.030213
Date:
March, 2010
File:
PDF, 239 KB
english, 2010
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