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Suppression of boron segregation by interface Ge atoms at SiGe/SiO2 interface
Lee, Chang Hwi, Kim, Geun-Myeong, Oh, Young Jun, Chang, K.J.Volume:
14
Language:
english
Journal:
Current Applied Physics
DOI:
10.1016/j.cap.2014.08.027
Date:
November, 2014
File:
PDF, 2.43 MB
english, 2014