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Spectral enhancement of a Xe-based EUV discharge plasma source
Zuppella, P, Reale, A, Ritucci, A, Tucceri, P, Prezioso, S, Flora, F, Mezi, L, Dunne, PVolume:
18
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/18/2/025014
Date:
May, 2009
File:
PDF, 442 KB
english, 2009