Plasma-Deposited SiO x...

Japanese Journal of Applied Physics 2013 / 07 Vol. 52; Iss. 7R

Plasma-Deposited SiO x C y H z Barrier Coatings for Organic Device Encapsulation

Lee, Seunghun, Kang, Yong-Jin, Jung, Sunghoon, Kim, Jong-Kuk, Kim, Do-Geun
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Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.076001
Date:
July, 2013
File:
PDF, 824 KB
english, 2013
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