Retention Characteristics of (Bi,La) 4...

Integrated Ferroelectrics 2003 / 02 Vol. 52; Iss. 1

Retention Characteristics of (Bi,La) 4 Ti 3 O 12 Films on Si(100) Substrates Using LaAlO 3 Buffer Layers

Park, Byung-Eun, Ishiwara, Hiroshi
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Volume:
52
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584580390254529
Date:
February, 2003
File:
PDF, 124 KB
english, 2003
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