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Retention Characteristics of (Bi,La) 4 Ti 3 O 12 Films on Si(100) Substrates Using LaAlO 3 Buffer Layers
Park, Byung-Eun, Ishiwara, HiroshiVolume:
52
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584580390254529
Date:
February, 2003
File:
PDF, 124 KB
english, 2003