Growth of (Ba,Sr)TiO 3 Thin Films by MOCVD: Stoichiometry Effects
Ehrhart, P., Fitsilis, F., Regnery, S., Waser, R., Schienle, F., Schumacher, M., Juergensen, H., Krumpen, W.Volume:
45
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584580215342
Date:
January, 2002
File:
PDF, 742 KB
english, 2002