Preferential Copper Electrodeposition at Submicrometer Trenches by Consumption of Halide Ion
Hayase, Masanori, Taketani, Munemasa, Hatsuzawa, Takeshi, Hayabusa, KeisukeVolume:
6
Year:
2003
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.1568832
File:
PDF, 465 KB
english, 2003