Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2008 Vol. 26; Iss. 1
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P implantation into preamorphized germanium and subsequent annealing: Solid phase epitaxial regrowth, P diffusion, and activation
M. Posselt, B. Schmidt, W. Anwand, R. Grötzschel, V. Heera, A. Mücklich, C. Wündisch, W. Skorupa, H. Hortenbach, S. Gennaro, M. Bersani, D. Giubertoni, A. Möller, H. BrachtVolume:
26
Year:
2008
Language:
english
DOI:
10.1116/1.2805249
File:
PDF, 721 KB
english, 2008