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[IEEE 2005 IEEE International Integrated Reliability Workshop - S. Lake Tahoe, CA, USA (17-20 Oct. 2005)] 2005 IEEE International Integrated Reliability Workshop - Combined effect of NBTI and Channel Hot Carrier effects in pMOSFETs
Guerin, C., Huard, V., Bravaix, A., Denais, M., Roux, J.M., Perrier, F., Baks, W.Year:
2005
Language:
english
DOI:
10.1109/IRWS.2005.1609553
File:
PDF, 1.68 MB
english, 2005