Plasma properties during magnetron sputtering of lithium...

Journal of Power Sources 2015 / 01 Vol. 273

Plasma properties during magnetron sputtering of lithium phosphorous oxynitride thin films

Christiansen, Ane S., Stamate, Eugen, Thydén, Karl, Younesi, Reza, Holtappels, Peter
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Volume:
273
Language:
english
Journal:
Journal of Power Sources
DOI:
10.1016/j.jpowsour.2014.09.174
Date:
January, 2015
File:
PDF, 3.10 MB
english, 2015
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