Production data based optimal etch time control design for...

IEEE Transactions on Semiconductor Manufacturing 1999 Vol. 12; Iss. 1

Production data based optimal etch time control design for a reactive ion etching process

S. Liamanond, J. Si, Yuan-ling Tseng
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Volume:
12
Year:
1999
Language:
english
DOI:
10.1109/66.744535
File:
PDF, 225 KB
english, 1999
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