[IEEE 2002 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (11-13 June 2002)] 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) - Characteristics and device design of sub-100 nm strained Si N- and PMOSFETs
Rim, K., Chu, J., Chen, H., Jenkins, K.A., Kanarsky, T., Lee, K., Mocuta, A., Zhu, H., Roy, R., Newbury, J., Ott, J., Petrarca, K., Mooney, P., Lacey, D., Koester, S., Chan, K., Boyd, D., Ieong, M., WYear:
2002
Language:
english
DOI:
10.1109/VLSIT.2002.1015406
File:
PDF, 279 KB
english, 2002