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[IEEE 2009 17th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Albany, NY, USA (2009.09.29-2009.10.2)] 2009 17th International Conference on Advanced Thermal Processing of Semiconductors - Accurate micro Hall Effect measurements on scribe line pads
Osterberg, F. W., Petersen, D.H., Wang, F., Rosseel, E., Vandervorst, W., Hansen, O.Year:
2009
Language:
english
DOI:
10.1109/RTP.2009.5373450
File:
PDF, 425 KB
english, 2009