[IEEE 2008 International Workshop on Junction Technology (IWJT) - Shanghai, China (2008.05.15-2008.05.16)] Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08) - Simulation on plasma doping for shallow junction formation
Min Yu,, Huihui Ji,, Ming Li,, Ru Huang,, Xing Zhang,Year:
2008
Language:
english
DOI:
10.1109/IWJT.2008.4540008
File:
PDF, 141 KB
english, 2008