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[IEEE 2012 12th International Workshop on Junction Technology (IWJT) - Shanghai (2012.05.14-2012.05.15)] 2012 12th International Workshop on Junction Technology - Phosphorous transient enhanced diffusion suppression with cluster carbon co-implantation at low temperature
Nakashima, Y., Hamamoto, N., Nagayama, T., Koga, Y., Umisedo, S., Hashimoto, M., Onoda, H.Year:
2012
Language:
english
DOI:
10.1109/IWJT.2012.6212821
File:
PDF, 524 KB
english, 2012