[IEEE 2011 International Symposium on VLSI Technology,...

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[IEEE 2011 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2011.04.25-2011.04.27)] Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications - Impact of compliance current overshoot on high resistance state, memory performance, and device yield of HfOx based resistive memory and its solution

Chen, Yu-Sheng, Liu, Wen-Hsing, Lee, Heng-Yuan, Chen, Pang-Shiu, Wang, Sum-Min, Tsai, Chen-Han, Hsu, Yen-Ya, Gu, Pei-Yi, Chen, Wei-Su, Chen, Frederick, Lien, Chen-Hsin, Tsai, Ming-Jinn
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Year:
2011
Language:
english
DOI:
10.1109/VTSA.2011.5872252
File:
PDF, 335 KB
english, 2011
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