[Japan Soc. Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (11-13 July 2000)] Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) - A new correction method for dry etch loading effect in photomask fabrication
Won-Tai Ki,, Seung-Hune Yang,, Seong-Yong Moon,, Seong-Woon Choi,, Woo-Sung Han,, Jung-Min Sohn,Year:
2000
Language:
english
DOI:
10.1109/IMNC.2000.872613
File:
PDF, 158 KB
english, 2000